DIY photolithography using a direct write laser machine.

This is a maskless technique (similar to projection lithography) to create patterns in a photosensitive resin (photoresist). This is a common step in many microfabrication operations like transistor/semiconductor fabrication, MEMS devices, microfluidics, etc.

The advantage of maskless litho over traditional masked lithography is that you don't need to generate a mask first (which often itself requires photolithography). Maskless is faster for one-off and prototype work, but mask is superior once you need to create millions of devices.

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==== Links ====
- "Maker Foundry" Hackaday project: https://hackaday.io/project/25260-mak...

==== Analysis Equipment ====
nGauge AFM from ICSPI (https://www.icspicorp.com/)
Phenom XL SEM from Thermo
Gwyddion for AFM post-processing
Blender for 3D AFM rendering

==== Timeline ====
0:00 Direct write laser lithography
1:01 Some exposed photoresist
2:06 Spatial filtering
3:59 Focus detection (unused)
5:08 Walking the beam
6:05 Galvo scanner
7:17 Scan/Tube lens
7:56 Microscope Objective and substrate
8:35 Optical Rlay Full Explanation
10:35 2x Beam Expander
11:33 Results (Datak Er-71)
12:40 Results (Microposit s1818)
16:37 Problems to fix